ITO靶材/粉體 ITO target/Powder

產(chǎn)品說(shuō)明Product description

ITO靶材是銦錫氧化物功能陶瓷材料，主要用于磁控濺射靶材制備ITO導(dǎo)電薄膜。采用先進(jìn)的常壓燒結(jié)工藝，多個(gè)靶管/靶塊拼接貼合為ITO靶材成品。

ITO target is a functional indium tin oxide ceramic material, which is used for deposition of ITO transparent conductive thin films with magnetron sputtering. It is produced by using the classic ceramic process at ambient pressure, in the form of tube/planar segments that are bonded into ITO target.

ITO旋轉(zhuǎn)靶/平面靶Rotary /Planar ITO target

應(yīng)用領(lǐng)域Applications

-導(dǎo)電玻璃Conductive glasses

-TFT-LCD, OLED, 觸摸屏Touch panel screens

-太陽(yáng)能電池Solar cells

ITO 粉體/低密度靶 ITO powder/low density target

應(yīng)用領(lǐng)域Applications

-蒸鍍制備透明導(dǎo)電薄膜 Vapor deposition of transparent and conductive thin films

-防紫外，防輻射涂料 Anti-UV, anti-radiation coatings

產(chǎn)品特點(diǎn)Product features:

-采用專(zhuān)用技術(shù)生產(chǎn)的ITO粉體，燒結(jié)密度高，微結(jié)構(gòu)均勻。

ITO powder is self-produced using our own patent technology, with high sintered density and homogeneous microstructure.

-具有導(dǎo)電導(dǎo)熱性好，強(qiáng)度高等優(yōu)點(diǎn)，減少結(jié)瘤現(xiàn)象和微電弧的出現(xiàn)。

High electrical and thermal conductivities, excellent mechanical property to minimize the formation of noddles and micro arc.

靶材尺寸Dimension

-旋轉(zhuǎn)靶每節(jié)長(zhǎng)度(Length of segment): 200-300 mm

-平面靶單節(jié)規(guī)格(Dimension of planar segment) 400×400 mm²

-按圖紙要求加工(According to customized drawings)